Positive Photo Resist Developer 418-500ML

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Qty In Stock: 15

Excl. Tax: £11.95 Incl. Tax: £14.34


Quick Overview

Remove exposed resist during the positive photofabrication process.

Concentrated - Dilute for use.


Positive Photo Resist Developer - Concentrated

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MG Product Code: 418-500ML

For removing exposed resist during the positive photofabrication process.

Disolves exposed photoresist
Concentrated formulation - dilute one part developer to ten parts water




Additional Information

Brand MG Chemicals
MG Product Type Prototyping